JPH0519296B2 - - Google Patents

Info

Publication number
JPH0519296B2
JPH0519296B2 JP62038181A JP3818187A JPH0519296B2 JP H0519296 B2 JPH0519296 B2 JP H0519296B2 JP 62038181 A JP62038181 A JP 62038181A JP 3818187 A JP3818187 A JP 3818187A JP H0519296 B2 JPH0519296 B2 JP H0519296B2
Authority
JP
Japan
Prior art keywords
substrate
substrate holder
semiconductor substrate
dust
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62038181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63204723A (ja
Inventor
Hisashi Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP62038181A priority Critical patent/JPS63204723A/ja
Publication of JPS63204723A publication Critical patent/JPS63204723A/ja
Publication of JPH0519296B2 publication Critical patent/JPH0519296B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62038181A 1987-02-20 1987-02-20 縮小投影露光装置 Granted JPS63204723A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62038181A JPS63204723A (ja) 1987-02-20 1987-02-20 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62038181A JPS63204723A (ja) 1987-02-20 1987-02-20 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS63204723A JPS63204723A (ja) 1988-08-24
JPH0519296B2 true JPH0519296B2 (en]) 1993-03-16

Family

ID=12518214

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62038181A Granted JPS63204723A (ja) 1987-02-20 1987-02-20 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPS63204723A (en])

Also Published As

Publication number Publication date
JPS63204723A (ja) 1988-08-24

Similar Documents

Publication Publication Date Title
KR102119331B1 (ko) 현상 유닛, 기판 처리 장치, 현상 방법 및 기판 처리 방법
KR100292935B1 (ko) 기판 처리 장치
JPH053184A (ja) ウエハの洗浄方法
JP4628623B2 (ja) ウェハ洗浄システムの処理前調整を実施する方法
KR20100071895A (ko) 세정 장치, 기판 처리 시스템, 세정 방법, 프로그램 및 컴퓨터 기억 매체
JP3011806B2 (ja) 角状被処理体のフォトレジスト除去装置
JPH0519296B2 (en])
JP2868652B2 (ja) 半導体露光装置
JPH08139153A (ja) 枚葉式基板処理装置、基板搬送装置及びカセット
JPH07130637A (ja) 半導体製造装置
JPH04107824A (ja) 洗浄用部材の洗浄方法
JP2006332185A (ja) 基板処理装置、及び基板処理方法
JPS63137448A (ja) 半導体ウエハ処理装置
JP6892176B1 (ja) ワーク洗浄装置
JP4507365B2 (ja) 基板端面洗浄装置
JP3537875B2 (ja) 基板洗浄装置
JP3324011B2 (ja) 回転塗布によって形成された塗布基板の不要膜除去装置
JPH03142929A (ja) 洗浄装置
JP3179571B2 (ja) ウェハ貼付プレートの洗浄および移送装置
JPH09199462A (ja) ウエハ洗浄方法及びそのための装置
JPH0778744A (ja) ウェーハ搬送・移載装置
JPH04278518A (ja) 半導体装置の製造方法と半導体製造装置
JPH0235980A (ja) 露光マスク洗浄装置
JPH05299332A (ja) 半導体ウェハのレジスト塗布方法及び吸着治具
CN119291998A (zh) 涂胶显影方法和涂胶显影系统

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees